Evolution of Surface Roughness During CVD Growth

Roughness evolution during growth of hydrogenated tetrahedral amorphous carbon

Hydrogenated tetrahedral amorphous carbon (ta-C:H) is advantageous as coating material for high-density magnetic and optical storage devices, due to its favorable combination of density and smoothness. An advantage of ta-C:H over tetrahedral amorphous carbon (ta-C) is the absence of macroparticles, often found in cathodic arc deposition of ta-C, and the hydrogen rich surface, compatible with th...

Crystal structure evolution of individual graphene islands during CVD growth on copper foil.

Single-crystal percentage of graphene islands on Cu foil is associated with island sizes and shapes. In polycrystalline islands, certain grain boundary types are favored. There is no obvious relation between the number of lobes and grain orientations. An observed structure evolution and surface disorder of Cu grains can be possible factors for the formation of grain boundaries within graphene i...

Analyzing the Evolution of Surface Roughness of Lunar

Introduction: About 17% of the lunar surface is covered by mare basalts [1], mainly concentrated on the lunar nearside. The main period of mare volcanism occurred during the late Imbrian Period, ~3.3-3.8 Ga [2], although volcanism continued to a lesser extent until ~1.2 Ga [3]. These dates were assigned by Hiesinger et al. using crater size-frequency distribution measurements applied to pre-def...

Anomalous roughness evolution of rubrene thin films observed in real time during growth.

We study the growth and structure of thin films of the organic semiconductor rubrene during organic molecular beam deposition (OMBD) on silicon oxide in situ and in real time using X-ray scattering. Using in situ grazing incidence diffraction (GID) we find a small degree of local order but an otherwise largely disordered structure, consistent with out of plane scans. Monitoring the surface morp...

Intrinsic stress, island coalescence, and surface roughness during the growth of polycrystalline films